辉光放电质谱检测标准

发布时间:2023-03-12 01:07:51 阅读量: 来源:中析研究所

辉光放电质谱相关标准参考信息

GB/T 37211.3-2022 金属锗化学分析方法 第3部分:痕量杂质元素的测定 辉光放电质谱法
简介:
信息:ICS:77.040 CCS:H17 发布:2022-12-30 实施:2023-04-01

YS/T 981.1-2014 高纯铟化学分析方法 镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅的测定 高质量分辨率辉光放电质谱法
简介:YS/T 981的本部分规定了采用高质量分辨率辉光放电质谱法测定99.999%以上高纯铟中镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅元素含量的方法。本部分适用于高纯铟中镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅的测定,各元素测定范围为5.0×10%~1.0×10%。
信息:ICS:77.040.30 CCS:H17 发布:2014-10-14 实施:2015-04-01

ASTM F1593-1997(2002) 应用高质量分辩率辉光放电质谱计测定电子级铝中微量金属杂质的标准试验方法
简介:This test method is intended for application in the semiconductor industry for evaluating the purity of materials (for example, sputtering targets, evaporation sources) used in thin film metallization processes. This test method may be useful in additional applications, not envisioned by the responsible technical committee, as agreed upon by the parties concerned. This test method is intended for use by GDMS analysts in various laboratories for unifying the protocol and parameters for determining trace impurities in pure aluminum. The objective is to improve laboratory to laboratory agreement of analysis data. This test method is also directed to the users of GDMS analyses as an aid to understanding the determination method, and the significance and reliability of reported GDMS data. For most metallic species the detection limit for routine analysis is on the order of 0.01 weight ppm. With special precautions detection limits to sub-ppb levels are possible. This test method may be used as a referee method for producers and users of electronic-grade aluminum materials.1.1 This test method covers measuring the concentrations of trace metallic impurities in high purity aluminum. 1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS). 1.3 The aluminum matrix must be 99.9 weight % (3N-grade) pure, or purer, with respect to metallic impurities. There must be no major alloy constituent, for example, silicon or copper, greater than 1000 weight ppm in concentration. 1.4 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment skillfully used by an experienced operator is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparation, setting of relative sensitivity factors, determination of sensitivity limits, etc.) known by the responsible technical committee to affect the reliability of high purity aluminum analyses.
信息:ICS:77.040.99 (Other methods of testing metals) CCS:H12 发布:1997 实施

GB/T 36590-2018 高纯银化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:
信息:ICS:77.120.99 CCS:H15 发布:2018-09-17 实施:2019-06-01 00:00:00.0

YS/T 897-2013 高纯铌化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:本标准规定了高纯铌中痕量杂质元素的测定方法,测定元素见表1。本标准适用于高纯铌中痕量杂质元素的测定。除钽、钼、钨外各元素测定范围为1.0 μg/kg~5 000 μg/kg,钽的测定范围为1.0 μg/kg~300 000μg/kg,钼和钨的测定范围为1.0 μg/kg~100 000μg/kg。
信息:ICS:77.120.99 CCS:H63 发布:2013-10-17 实施:2014-03-01

AS 3685-1998 辉光放电质谱法(GD-MS)的建议程序和原则
简介:A guide on the operation and recommendations for use of glow discharge mass spectrometry. The guidelines given are intended primarily for the development and application of a standard method. They may be applied less rigidly in ordinary routine operation. They are intended to be of general applicability and not restricted to a given class of material.
信息:ICS:71.040.50 CCS发布实施

GB/T 33236-2016 多晶硅 痕量元素化学分析 辉光放电质谱法
简介:
信息:ICS:71.040.40 CCS:G04 发布:2016-12-13 实施:2017-11-01 00:00:00.0

YS/T 891-2013 高纯钛化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:本标准规定了高纯钛中痕量元素含量的测定方法,测定元素见表1。本标准适用于高纯钛中痕量元素含量的测定。各元素测定范围为1.0 μg/kg~5 000 μg/kg。
信息:ICS:77.120.50 CCS:H64 发布:2013-10-17 实施:2014-03-01

AS 3685-1998 辉光放电质谱法(GD-MS)的建议程序和原则
简介:A guide on the operation and recommendations for use of glow discharge mass spectrometry. The guidelines given are intended primarily for the development and application of a standard method. They may be applied less rigidly in ordinary routine operation
信息:ICS:71.040.50 CCS发布实施

GB/T 32651-2016 采用高质量分辨率辉光放电质谱法测量太阳能级硅中痕量元素的测试方法
简介:
信息:ICSCCS发布:2016-04-25 实施:2016-11-01

YS/T 899-2013 高纯钽化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:本标准规定了高纯钽中痕量元素含量的测定方法,测定元素见表1。本标准适用于高纯钽中痕量元素含量的测定。除铌、钼、钨外各元素测定范围为1μg/kg~5 000 μg/kg,铌、钼和钨的测定范围为1 μg/kg~100 000 μg/kg。
信息:ICS:77.120.99 CCS:H63 发布:2013-10-17 实施:2014-03-01

简介: 信息:

GB/T 23275-2009 钌粉化学分析方法.铅、铁、镍、铝、铜、银、金、铂、铱、钯、铑、硅量的测定.辉光放电质谱法
简介:本标准规定了钌粉中的铅、铁、镍、铝、铜、银、金、铂、铱、钯、铑、硅含量的测定方法。本标准适用于钌粉中的铅、铁、镍、铝、铜、银、金、铂、铱、钯、铑、硅含量的测定,其测定范围见表1。
信息:ICS:77.040.30 CCS:H15 发布:2009-01-05 实施:2009-11-01

YS/T 917-2013 高纯镉化学分析方法 痕量杂质元素含量的测定 辉光放电质谱法
简介:本标准规定了高纯镉中痕量杂质元素含量的测定方法,测定元素见表1。本标准适用于高纯镉中痕量杂质元素含量的测定。各元素测定范围如下:硫、硒元素的测定范围为100 μg/kg~5 000 μg/kg,其余元素的测定范围为1 μg/kg~5 000 μg/kg。
信息:ICS:77.120.70 CCS:H13 发布:2013-10-17 实施:2014-03-01

简介: 信息:

YS/T 1473-2021 高纯钼化学分析方法 ?痕量杂质元素的测定 ?辉光放电质谱法
简介:
信息:ICS:77.120.99 CCS:H63 发布:2021-12-02 实施:2022-04-01

YS/T 923.2-2013 高纯铋化学分析方法 第2部分: 痕量杂质元素含量的测定 辉光放电质谱法
简介:YS/T 923的本部分规定了高纯铋中痕量杂质元素含量的测定方法,测定元素见表1。本部分适用于高纯铋中痕量杂质元素含量的测定。各元素测定范围为5.0 μg/kg~5 000 μg/kg。
信息:ICS:77.120.99 CCS:H13 发布:2013-10-17 实施:2014-03-01

简介: 信息:

YS/T 1504-2021 高纯钯化学分析方法?杂质元素含量的测定?辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H15 发布:2021-12-02 实施:2022-04-01

YS/T 895-2013 高纯铼化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:本标准规定了高纯铼中痕量元素含量的测定方法,测定元素见表1。本标准适用于高纯铼中痕量元素含量的测定。各元素测定范围如下:硫、硒和汞元素的测定范围为50 μg/kg~5 000μg/kg,其余元素的测定范围为5 μg/kg~5 000 μg/kg。
信息:ICS:77.120.99 CCS:H63 发布:2013-10-17 实施:2014-03-01

简介: 信息:

YS/T 1494-2021 高纯金化学分析方法 杂质元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H15 发布:2021-12-02 实施:2022-04-01

YS/T 901-2013 高纯钨化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:本标准规定了高纯钨中痕量元素含量的测定方法,测定元素见表1。本标准适用于高纯钨中痕量元素含量的测定。各元素测定范围为1 μg/kg~5 000 μg/kg。
信息:ICS:77.120.99 CCS:H63 发布:2013-10-17 实施:2014-03-01

简介: 信息:

YS/T 1493-2021 高纯铂化学分析方法 杂质元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H15 发布:2021-12-02 实施:2022-04-01

YS/T 922-2013 高纯铜化学分析方法 痕量杂质元素含量的测定 辉光放电质谱法
简介:本标准规定了高纯铜中痕量杂质元素含量的测定方法,测定元素见表1。本标准适用于高纯铜中痕量杂质元素含量的测定。各元素测定范围如下:硫、硒元素的测定范围为10 μg/kg~5 000 μg/kg,其余元素的测定范围为1 μg/kg~5 000 μg/kg。
信息:ICS:77.120.30 CCS:H13 发布:2013-10-17 实施:2014-03-01

简介: 信息:

YS/T 1505-2021 高纯钌化学分析方法?杂质元素含量的测定?辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H15 发布:2021-12-02 实施:2022-04-01

YS/T 229.4-2013 高纯铅化学分析方法 第4部分:痕量杂质元素含量的测定 辉光放电质谱法
简介:YS/T 229的本部分规定了高纯铅中痕量杂质元素含量的测定方法,测定元素见表1。本部分适用于高纯铅中痕量杂质元素含量的测定。各元素测定范围如下:硫、硒元素的测定范围为100 μg/kg~5 000 μg/kg,其余元素的测定范围为 1 μg/kg~5 000 μg/kg。
信息:ICS:77.120.60 CCS:H13 发布:2013-10-17 实施:2014-03-01

简介: 信息:

YS/T 1506-2021 高纯铱化学分析方法?杂质元素含量的测定?辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H15 发布:2021-12-02 实施:2022-04-01

YS/T 871-2013 高纯铝化学分析方法 痕量杂质元素的测定 辉光放电质谱法
简介:本标准规定了采用高质量分辨率辉光放电质谱法测定高纯铝中痕量元素的测试方法、本标准适用于高纯铝中痕量元素含量的测定、各元素测定范围为5.0×10%~1.0×10%(ω%)、
信息:ICS:77.120.40 CCS:H12 发布:2013-04-25 实施:2013-09-01

简介: 信息:

YS/T 1495-2021 高纯铑化学分析方法 杂质元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H15 发布:2021-12-02 实施:2022-04-01

YS/T 35-2012 高纯锑化学分析方法 镁、锌、镍、铜、银、镉、铁、硫、砷、金、锰、铅、铋、硅、硒含量的测定 高质量分辨率辉光放电质谱法
简介:本方法规定了纯度w(Sb)≥99.999%高纯锑中镁、锌、镍、铜、银、镉、铁、硫、砷、金、锰、铅、铋、硅、硒含量的测定方法。本方法适用于纯度W(Sb)≥99.999%高纯锑中镁、锌、镍、铜、银、镉、铁、硫、砷、金、锰、铅、铋、硅、硒含量的测定。各元素测定范围为1.0X10%~1.5×10%(W%)。
信息:ICS:77.040.30 CCS:H13 发布:2012-12-28 实施:2013-06-01

简介: 信息:

XB/T 628-2020 高纯稀土金属化学分析方法 痕量元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.040.30 CCS:H14 发布:2020-12-09 实施:2021-04-01

DB35/T 1146-2011 硅材料中杂质元素含量测定 辉光放电质谱法
简介:本标准规定了测定硅材料中杂质元素含量的辉光放电质谱法(G D M S )所涉及的术语和定义、原理、试剂与材料、仪器设备、样品要求、样品要求、分析步骤、结果计算、允许偏差。 本标准适用于纯度不高于99.99999%的硅材料中的杂质元素L i、Be、B、N a、M g、A 1、P、K、T h、U等元素的测定
信息:ICS:29.045 CCS:H80 发布:2011-04-10 实施:2011-07-10

简介: 信息:

YS/T 1347-2020 高纯铪化学分析方法 痕量杂质元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.120.99 CCS:H14 发布:2020-04-16 实施:2020-10-01

BS DD ISO/TS 15338-2009 表面化学分析.辉光放电质谱法(GD-MS).用法介绍
简介:
信息:ICS:71.040.50 CCS:G04 发布:2009-08-31 实施:2009-08-31

简介: 信息:

ISO/TS 15338-2020 表面化学分析 - 辉光放电质谱 - 操作程序
简介:
信息:ICS:71.040.40 CCS发布:2020-03-05 实施

BS DD ISO/TS 15338-2009 表面化学分析.辉光放电质谱法(GD-MS).用法介绍
简介:
信息:ICS:71.040.50 CCS:G04 发布:2009-08-31 实施:2009-08-31

简介: 信息:

YS/T 1288.4-2018 高纯锌化学分析方法 第4部分:痕量元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.120.60 CCS:H13 发布:2018-10-22 实施:2019-04-01

ISO/TS 15338-2009 表面化学分析.辉光放电质谱测定法(GD-MS).使用介绍
简介:This Technical Specification gives guidelines for the operation of glow discharge mass spectrometry (GD-MS)instruments and recommendations for the use of GD-MS. It is intended to be read in conjunction with theinstrument manufacturers’ manuals and recommendations.
信息:ICS:71.040.40;71.040.50 CCS:G04 发布:2009-04 实施

简介: 信息:

YS/T 1288.4-2018 高纯锌化学分析方法 第4部分:痕量元素含量的测定 辉光放电质谱法
简介:
信息:ICS:77.120.60 CCS:H13 发布:2018-10-22 实施:2019-04-01

ISO/TS 15338:2009 表面化学分析——辉光放电质谱(GD-MS)——使用简介
简介:
信息:ICS:71.040.40 CCS发布:2009-03-23 实施

简介: 信息:

T/SDAS 4-2016 高纯金化学分析方法 杂质元素含量的测定 辉光放电质谱法
简介:试料作为阴极进行辉光放电,其表面原子被溅射而脱离试样进入辉光放电等离子体中,在等离子体中离子化后被导入质谱仪。在每一元素同位素质量数处以预设的扫描点数和积分时间对相应谱峰积分,所得面积即为谱峰强度。进行半定量分析时,计算机根据仪器软件中的“典型相对灵敏度因子”自动计算出各元素的质量含量;进行定量分析时,需通过在与被测样品相同的分析条件、离子源结构以及测试条件下对标准样品进行独立测定获得相对灵敏度因子,应用该相对灵敏度因子计算出各元素的质量含量,金的质量分数以杂质减量法确定。
信息:ICS:17.180.01 CCS:M745 发布:2016-10-13 实施:2017-07-07

ASTM F1710-2008 应用高质量分辩率辉光放电质谱计测定电子级钛中微量金属杂质的标准试验方法
简介:This test method is intended for application in the semiconductor industry for evaluating the purity of materials (for example, sputtering targets, evaporation sources) used in thin film metallization processes. This test method may be useful in additional applications, not envisioned by the responsible technical committee, as agreed upon between the parties concerned. This test method is intended for use by GDMS analysts in various laboratories for unifying the protocol and parameters for determining trace impurities in pure titanium. The objective is to improve laboratory to laboratory agreement of analysis data. This test method is also directed to the users of GDMS analyses as an aid to understanding the determination method, and the significance and reliability of reported GDMS data. For most metallic species the detection limit for routine analysis is on the order of 0.01 weight ppm. With special precautions detection limits to sub-ppb levels are possible. This test method may be used as a referee method for producers and users of electronic-grade titanium materials.1.1 This test method covers the determination of concentrations of trace metallic impurities in high purity titanium. 1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS). 1.3 The titanium matrix must be 99.9 weight % (3N-grade) pure, or purer, with respect to metallic impurities. There must be no major alloy constituent, for example, aluminum or iron, greater than 1000 weight ppm in concentration. 1.4 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment skillfully used by an experienced operator is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparation, setting of relative sensitivity factors, determination of sensitivity limits, etc.) known by the responsible technical committee to effect the reliability of high purity titanium analyses. 1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
信息:ICS:77.040.99 (Other methods of testing metals) CCS:L90 发布:2008 实施

简介: 信息:

YS/T 981.1-2014 高纯铟化学分析方法 镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅的测定 高质量分辨率辉光放电质谱法
简介:YS/T 981的本部分规定了采用高质量分辨率辉光放电质谱法测定99.999%以上高纯铟中镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅元素含量的方法。本部分适用于高纯铟中镁、铝、硅、硫、铁、镍、铜、锌、砷、银、镉、锡、铊、铅的测定,各元素测定范围为5.0×10%~1.0×10%。
信息:ICS:77.040.30 CCS:H17 发布:2014-10-14 实施:2015-04-01

ASTM F1593-2008 应用高质量分辩率辉光放电质谱计测定电子级铝中微量金属杂质的标准试验方法
简介:This test method is intended for application in the semiconductor industry for evaluating the purity of materials (for example, sputtering targets, evaporation sources) used in thin film metallization processes. This test method may be useful in additional applications, not envisioned by the responsible technical committee, as agreed upon by the parties concerned. This test method is intended for use by GDMS analysts in various laboratories for unifying the protocol and parameters for determining trace impurities in pure aluminum. The objective is to improve laboratory to laboratory agreement of analysis data. This test method is also directed to the users of GDMS analyses as an aid to understanding the determination method, and the significance and reliability of reported GDMS data. For most metallic species the detection limit for routine analysis is on the order of 0.01 weight ppm. With special precautions detection limits to sub-ppb levels are possible. This test method may be used as a referee method for producers and users of electronic-grade aluminum materials.1.1 This test method covers measuring the concentrations of trace metallic impurities in high purity aluminum. 1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS). 1.3 The aluminum matrix must be 99.9 weight % (3N-grade) pure, or purer, with respect to metallic impurities. There must be no major alloy constituent, for example, silicon or copper, greater than 1000 weight ppm in concentration. 1.4 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment skillfully used by an experienced operator is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparation, setting of relative sensitivity factors, determination of sensitivity limits, etc.) known by the responsible technical committee to affect the reliability of high purity aluminum analyses. 1.5 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
信息:ICS:77.040.99 CCS:L90 发布:2008 实施

简介: 信息:

YS/T 1012-2014 高纯镍化学分析方法 杂质元素含量的测定 辉光放电质谱法
简介:本标准规定了高纯镍中杂质元素的测定方法,测定元素见表1。本标准适用于高纯镍中杂质元素含量的测定,各元素质量分数测定范围为0.1 μg/kg~20 000 μg/kg。
信息:ICS:77.120.40 CCS:H13 发布:2014-10-14 实施:2015-04-01

ASTM F1593-1997 应用高质量分辩率辉光放电质谱计测定电子级铝中微量金属杂质的标准试验方法
简介:1.1 This test method covers measuring the concentrations of trace metallic impurities in high purity aluminum. 1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS). 1.3 The aluminum matrix must be 99.9 weight % (3N-grade) pure, or purer, with respect to metallic impurities. There must be no major alloy constituent, for example, silicon or copper, greater than 1000 weight ppm in concentration. 1.4 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment skillfully used by an experienced operator is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparation, setting of relative sensitivity factors, determination of sensitivity limits, etc.) known by the responsible technical committee to affect the reliability of high purity aluminum analyses.
信息:ICSCCS:H12 发布:1997 实施

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